As one of the world's leading suppliers of vacuum technology, Pfeiffer Vacuum has once again launched the new multi-stage Roots pump ACP 90, which is specially designed for oil-free and particle-free applications in the pressure range from atmospheric pressure to 3x10-2 hPa, which meets the requirements of drying , sterilization, coating, as well as semiconductor and R&D applications that require a high clean and dry vacuum environment.
The unique pumping unit design of the new multi-stage Roots pump ACP 90 can withstand frequent emptying, enhancing the robustness of the pump. Among them, the high-value materials used, such as aluminum plating and stainless steel, increase the resistance of these pumps to mildly corrosive gases.
Not only that, but the ACP 90 has a high dilution capability with ambient air or neutral gases, making it ideal for pumping large volumes of condensable gases in dry applications, high humidity environments or large insulated volumes.
Jean-Philippe Briton, Product Manager at Pfeiffer Vacuum, said: “We are very proud of the intelligent management between the inlet stage and the pump outlet, which allows high pumping speeds at high pressures, when pumping large volumes. It is of vital importance. Furthermore, the ACP 90 has an extremely low power consumption of only 2 kW at atmospheric pressure, making the ACP 90 a perfect energy-saving solution for this type of use.”
In addition, the new multistage Roots pump ACP 90 is CE and UL/CSA compliant.
